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Title:
POLYMER PRODUCTION METHOD, POLYMER FOR USE IN LITHOGRAPHY, RESIST COMPOSITION AND SUBSTRATE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2011/004840
Kind Code:
A1
Abstract:
Disclosed is a production method for a polymer. The polymer can reduce or eliminate variations in molecular weight and in the percentage of constitutional units contained in a copolymer, and can improve solubility in solvents and improve sensitivity when used in a resist composition. The polymer production method comprises a polymerisation step, whereby polymers are obtained through the polymerisation of two or more kinds of monomers during the drip-feeding of monomers and a polymerisation initiator into a reactor. During the first stage of the polymerisation step a first solution, which contains monomers in a first composition, is supplied. The dropping of a second solution, which contains monomers in a second composition, is initiated either after or at the same time as the initiation of the supply of the first solution. The second composition is the same as the target composition of the desired polymer. The first composition is a composition that is determined beforehand, taking into account the target composition and the reactivity of each monomer present in the polymer. Also, the drip-feeding speed of the polymerisation initiator during the first stage of the polymerisation process is increased.

Inventors:
YASUDA Atsushi (Mitsubishi Rayon Co. Ltd., 10-1, Daikoku-cho, Tsurumi-ku, Yokohama-sh, Kanagawa 53, 〒2300053, JP)
安田 敦 (〒53 神奈川県横浜市鶴見区大黒町10番1号 三菱レイヨン株式会社横浜先端技術研究所内 Kanagawa, 〒2300053, JP)
OSHIKIRI Tomoya (Mitsubishi Rayon Co. Ltd., 10-1, Daikoku-cho, Tsurumi-ku, Yokohama-sh, Kanagawa 53, 〒2300053, JP)
押切 友也 (〒53 神奈川県横浜市鶴見区大黒町10番1号 三菱レイヨン株式会社横浜先端技術研究所内 Kanagawa, 〒2300053, JP)
MATSUMOTO Daisuke (Mitsubishi Rayon Co. Ltd., 10-1, Daikoku-cho, Tsurumi-ku, Yokohama-sh, Kanagawa 53, 〒2300053, JP)
Application Number:
JP2010/061534
Publication Date:
January 13, 2011
Filing Date:
July 07, 2010
Export Citation:
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Assignee:
Mitsubishi Rayon Co., Ltd. (6-41, Konan 1-chome Minato-k, Tokyo 06, 〒1088506, JP)
三菱レイヨン株式会社 (〒06 東京都港区港南一丁目6番41号 Tokyo, 〒1088506, JP)
YASUDA Atsushi (Mitsubishi Rayon Co. Ltd., 10-1, Daikoku-cho, Tsurumi-ku, Yokohama-sh, Kanagawa 53, 〒2300053, JP)
安田 敦 (〒53 神奈川県横浜市鶴見区大黒町10番1号 三菱レイヨン株式会社横浜先端技術研究所内 Kanagawa, 〒2300053, JP)
OSHIKIRI Tomoya (Mitsubishi Rayon Co. Ltd., 10-1, Daikoku-cho, Tsurumi-ku, Yokohama-sh, Kanagawa 53, 〒2300053, JP)
押切 友也 (〒53 神奈川県横浜市鶴見区大黒町10番1号 三菱レイヨン株式会社横浜先端技術研究所内 Kanagawa, 〒2300053, JP)
International Classes:
C08F2/00; C08F220/10; G03F7/26
Domestic Patent References:
1999-10-07
Foreign References:
JP2008239889A2008-10-09
JP2008115148A2008-05-22
JP2007045922A2007-02-22
Attorney, Agent or Firm:
SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)
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