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Title:
POLYMERIC COMPOSITIONS AND ARTICLES WITH ANISOTROPIC LIGHT SCATTERING AND METHODS OF MAKING AND USING
Document Type and Number:
WIPO Patent Application WO2002057384
Kind Code:
A3
Abstract:
A polymeric composition includes a first polymeric material, for example, an adhesive material, and a second polymeric material disposed as a plurality of elongated structures within the first polymeric material. Each elongated structure has a major axis and the major axes are substantially aligned. The first polymeric material has an index of refraction that differs by at least 0.01 from an index of refraction of the second polymeric material. In some instances, a pressure sensitive adhesive material is selected as the first polymeric material. The orientation of the elongated structures and the difference in indices of refraction results in the polymeric composition scattering light asymmetrically. The polymeric composition is optionally disposed on a substrate and can be used, for example, to extract light from a light guide or to asymmetrically alter the viewing angle of a display.

Inventors:
ZHOU ZHIMING
MA JIAYING
MOSHREFZADEH ROBERT S
EVERAERTS ALBERT I
Application Number:
PCT/US2001/049251
Publication Date:
October 24, 2002
Filing Date:
December 18, 2001
Export Citation:
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Assignee:
3M INNOVATIVE PROPERTIES CO (US)
International Classes:
G02F1/1334; C09J7/38; C09J11/08; C09J107/00; C09J123/00; C09J129/10; C09J133/04; C09J153/00; C09J201/00; (IPC1-7): C09J11/08; C09J7/02
Domestic Patent References:
WO1997001610A11997-01-16
Other References:
DATABASE WPI Section Ch Week 199923, Derwent World Patents Index; Class A85, AN 1999-267418, XP002205078
DATABASE WPI Section Ch Week 200036, Derwent World Patents Index; Class A23, AN 2000-418302, XP002205079
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