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Patent Searching and Data


Title:
POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2001/057597
Kind Code:
A1
Abstract:
A polymeric compound for photoresists which comprises monomer units represented by formula (I); and a resin composition for photoresists which comprises the polymeric compound and a photo-acid generator. The composition has high adhesion to substrates and can precisely form a fine pattern.

Inventors:
Funaki, Yoshinori (1367-5, Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
Tsutsumi, Kiyoharu (940 Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
Takaragi, Akira (940 Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
Application Number:
PCT/JP2001/000515
Publication Date:
August 09, 2001
Filing Date:
January 26, 2001
Export Citation:
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Assignee:
DAICEL CHEMICAL INDUSTRIES, LTD. (1 Teppo-cho Sakai-shi Osaka, 590-8501, JP)
Funaki, Yoshinori (1367-5, Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
Tsutsumi, Kiyoharu (940 Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
Takaragi, Akira (940 Shinzaike Aboshi-ku Himeji-shi Hyogo, 671-1234, JP)
International Classes:
H01L21/027; C08F18/00; C08F20/10; C08F22/06; C08F32/00; C08F32/08; C08F232/02; G03F7/039; G03F7/004; (IPC1-7): G03F7/039; C08F20/10; C08F22/06; C08F32/00; H01L21/027
Foreign References:
JPH10218941A
JPH11305444A
US6103845A
JPH11352693A
GB2332679A
US6063542A
Other References:
See also references of EP 1172694A1
Attorney, Agent or Firm:
Goto, Yukihisa (202 Masuda Building 7-16, Higashitenma 2-chome Kita-ku Osaka-shi Osaka, Higashitenma 2-chome Kita-ku Osaka-shi Osaka, 530-0044, JP)
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