Title:
POLYMERIZABLE FLUORINE-CONTAINING SULFONATE, FLUORINE-CONTAINING SULFONATE RESIN, RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2012/050015
Kind Code:
A1
Abstract:
According to the invention, a sulfonate resin having a repeating unit represented by general formula (3) is provided. In formula (3), X represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R1 represents a hydrogen atom, a halogen atom, or an alkyl group or fluorine-containing alkyl group having 1 to 3 carbon atoms; R2 represents RAO or RBRCN; and M+ represents a monovalent cation. The sulfonate resin has a structure in which onium sulfonate is incorporated in a side chain and an anion is fixed to a resin side, and is used preferably as a resist resin having a high solubility in propylene glycol monomethyl ether acetate.
Inventors:
TAKIHANA RYOZO
NARIZUKA SATORU
NARIZUKA SATORU
Application Number:
PCT/JP2011/072931
Publication Date:
April 19, 2012
Filing Date:
October 05, 2011
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
TAKIHANA RYOZO
NARIZUKA SATORU
TAKIHANA RYOZO
NARIZUKA SATORU
International Classes:
C08F20/38; C07C309/10; C07C381/12; C08F220/26; C08F232/04; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| WO2006121096A1 | 2006-11-16 |
Foreign References:
| JP2008133448A | 2008-06-12 | |||
| JP2009007327A | 2009-01-15 | |||
| JP2009275155A | 2009-11-26 | |||
| JP2010095643A | 2010-04-30 |
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
Hiromichi Kobayashi (JP)
Hiromichi Kobayashi (JP)
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Claims: