POLY(METH)ACRYLIMIDE FILM, EASY-ADHESION FILM USING SAME, AND METHOD FOR MANUFACTURING SUCH FILMS

Title:

POLY(METH)ACRYLIMIDE FILM, EASY-ADHESION FILM USING SAME, AND METHOD FOR MANUFACTURING SUCH FILMS

Document Type and Number:

WIPO Patent Application WO/2015/005049

Kind Code:

A1

Abstract:

The present invention relates to a poly(meth)acrylimide film with outstanding surface smoothness, transparency, and appearance and low retardation and a method for manufacturing such a film. The present invention provides a poly(meth)acrylimide film that has (i) a total light transmittance of over 90% and (ii) haze of 2.0% or less. This film preferably has retardation of less than 50 nm. The method for manufacturing this film comprises the following: (A) a step in which, using a device provided with an extruder and a T die, a poly(meth)acrylimide molten film is continuously extruded from the T die; and (B) a step in which the poly(meth)acrylimide molten film is loaded by being fed between a rotating or circulating first mirrored-surface body and a rotating or circulating second mirrored-surface body, and then the film is pressed. During these steps, (C) the surface temperature of the first mirrored-surface body is in the range 100-200°C, and (D) the surface temperature of the second mirrored-surface body is in the range 20-200°C.

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Inventors:

NAKASHIMA KOHEI (JP)
YAMADA KAZUTAKA (JP)
SUGIMOTO HIDEMASA (JP)
ZENNYOJI YOSHIHIRO (JP)

Application Number:

PCT/JP2014/065440

Publication Date:

January 15, 2015

Filing Date:

June 11, 2014

Export Citation:

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Assignee:

RIKEN TECHNOS CORP (JP)

International Classes:

B29C48/08; B29C48/305; B32B27/30; C08J5/18; C08J7/043; C08J7/046

Foreign References:

JPH06166714A	1994-06-14
JP2006182879A	2006-07-13
JP2008277022A	2008-11-13
JP2010105188A	2010-05-13

Attorney, Agent or Firm:

ASAMURA PATENT OFFICE, p. c. (JP)
Patent business corporation Asamura patent firm (JP)

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