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Patent Searching and Data


Title:
POLY(P-HYDROXYSTYRENE)-BASED OXETANE RESIN, AND SYNTHESIS AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/205896
Kind Code:
A1
Abstract:
Disclosed are a polymer of formula (I), a method for preparing the polymer of formula (I), the use of the polymer of formula (I) as a film-forming resin in a photoresist, and a photoresist comprising the polymer of formula (I) as a film-forming resin.

Inventors:
ZOU YINGQUAN (CN)
GUO YEJIA (CN)
WANG ZHENG (CN)
PANG YULIAN (CN)
Application Number:
CN2018/085810
Publication Date:
November 15, 2018
Filing Date:
May 07, 2018
Export Citation:
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Assignee:
HUBEI GURUN TECH CO (CN)
International Classes:
C08F8/00; C08F12/24; C09J137/00
Foreign References:
JP2005031642A2005-02-03
JP2013190507A2013-09-26
CN103387636A2013-11-13
Other References:
LIU, HAITAO ET AL.: "Research on the Photopolymerization Kinetics of Oxetane", JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY, vol. 36, no. 11, 30 November 2008 (2008-11-30)
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (CN)
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