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Title:
POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/205818
Kind Code:
A1
Abstract:
The present invention relates to a polymer of formula (I), wherein Ra-Rd, Ra0-Rd0, Ra1-Rd1, Ra2-Rd2, n, n0, n1 and n2 are as defined in the description. When the polymer is used as a film-forming resin for a photoresist, same has the following advantages: a good ultraviolet light transmittance, a large viscosity, being capable of forming a thick film, a fast photosensitive speed, a high resolution, etc. The present invention further relates to a method for preparing the polymer of formula (I), the use of the polymer of formula (I) as a film-forming resin in a photoresist, and a photoresist comprising the polymer of formula (I) as a film-forming resin.

Inventors:
ZOU, Yingquan (Beijing Normal University, Xinjiekou Wai Street 19 Haidian District, Beijing 5, 100875, CN)
GUO, Yejia (Beijing Normal University, Xinjiekou Wai Street 19 Haidian District, Beijing 5, 100875, CN)
WANG, Zheng (Beijing Normal University, Xinjiekou Wai Street 19 Haidian District, Beijing 5, 100875, CN)
PANG, Yulian (Beijing Normal University, Xinjiekou Wai Street 19 Haidian District, Beijing 5, 100875, CN)
Application Number:
CN2018/083911
Publication Date:
November 15, 2018
Filing Date:
April 20, 2018
Export Citation:
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Assignee:
HUBEI GURUN TECHNOLOGY CO. (Third Group, Fengmiao Village Chemical Circulation Industrial Par, Jingmen Hubei 0, 448000, CN)
International Classes:
C08F12/24; C08F8/08; C08G59/20; G03C1/72; G03F7/00
Domestic Patent References:
WO2008085513A12008-07-17
WO2000064955A12000-11-02
Foreign References:
JPS59175483A1984-10-04
JPS61120822A1986-06-07
JPS60134234A1985-07-17
CN101643525A2010-02-10
CN102391406A2012-03-28
CN105924553A2016-09-07
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (7F New Era Building, 26 Pinganli Xidajie Xicheng District, Beijing 4, 100034, CN)
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