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Title:
POLYPROPYLENE FOR FILM CONDENSER, BIAXIAL STRETCHING FILM FOR FILM CONDENSER, FILM CONDENSER AND MANUFACTURING METHODS THEREFOR
Document Type and Number:
WIPO Patent Application WO/2016/159044
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a film condenser that comprises a polypropylene (F) for film condensers with superior stretching ability and uniformity when stretched that is suitable for biaxial stretching film with a low thermal shrinkage percentage and that has a dielectric breakdown voltage sufficient for use under harsh conditions of high temperatures and high frequency electric currents, and said biaxial stretching film. The polypropylene (F) of the present invention has an (1) MFR (JIS K 7210, 230°C, 2.16 kg load) in the range of 1-10 (g/10min), an (2) mmmm fraction that is at least 93%, (3) a <2,1>erythro position defect amount as measured using 13C-NMR that is less than 0.1 mol%, (4) ash content obtained by complete combustion in atmosphere that is at most 50 ppm, (5) chlorine content as measured by ion chromatography that is at most 5 ppm and is (6) obtained by including a propylene homopolymer for which Mw/Mn as measured via GPC is 6.5-12 and an α-crystal nucleating agent with a melting point of at most 290°C.

Inventors:
TAMURA, Satoshi (3, Chigusakaigan, Ichihara-sh, Chiba 08, 〒2990108, JP)
BIRUKAWA, Jun (3, Chigusakaigan, Ichihara-sh, Chiba 08, 〒2990108, JP)
SHIMIZU, Hiroki (3, Chigusakaigan, Ichihara-sh, Chiba 08, 〒2990108, JP)
Application Number:
JP2016/060304
Publication Date:
October 06, 2016
Filing Date:
March 30, 2016
Export Citation:
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Assignee:
PRIME POLYMER CO., LTD. (5-2 Higashi-Shimbashi 1-chome, Minato-ku Tokyo, 22, 〒1057122, JP)
International Classes:
C08L23/12; C08J5/18; C08K5/156; H01G4/18
Domestic Patent References:
WO2010107052A12010-09-23
Foreign References:
JP2010219328A2010-09-30
JP2015000960A2015-01-05
JP2010219329A2010-09-30
JPH08290536A1996-11-05
JP2001310948A2001-11-06
Other References:
See also references of EP 3279254A4
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (Gotanda Yamazaki Bldg. 6F, 13-6 Nishigotanda 7-chome, Shinagawa-k, Tokyo 31, 〒1410031, JP)
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