Title:
POLYURETHANE, COMPOSITION FOR FORMATION OF POLISHING LAYERS THAT CONTAINS SAME, PAD FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2010/146982
Kind Code:
A1
Abstract:
A polyurethane prepared by reacting a mixture which contains at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, characterized in that: the polyol (B) has a number-average molecular weight of 400 to 5,000; the chain extender (C) contains (C1) a compound of general formula (1) and (C2) a compound of general formula (2); the number-average molecular weights of the compounds (C1) and (C2) are each less than 400; and the M1/(M1+M2) value is 0.25 to 0.9 wherein M1 is the molar amount of the compound (C1) and M2 is that of the compound (C2).
HO-(CR1R2)2m+1 – OH ... (1)
HO-(CR3R4)2n – OH ... (2)
Inventors:
OKAMOTO, Takahiro (9-2 Higashi-shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
岡本 隆浩 (〒40 東京都港区東新橋一丁目９番２号 ＪＳＲ株式会社内 Tokyo, 〒1058640, JP)
岡本 隆浩 (〒40 東京都港区東新橋一丁目９番２号 ＪＳＲ株式会社内 Tokyo, 〒1058640, JP)
Application Number:
JP2010/059184
Publication Date:
December 23, 2010
Filing Date:
May 31, 2010
Export Citation:
Assignee:
JSR CORPORATION (9-2 Higashi-shinbashi 1-chome, Minato-ku Tokyo, 40, 〒1058640, JP)
ＪＳＲ株式会社 (〒40 東京都港区東新橋一丁目９番２号 Tokyo, 〒1058640, JP)
OKAMOTO, Takahiro (9-2 Higashi-shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
ＪＳＲ株式会社 (〒40 東京都港区東新橋一丁目９番２号 Tokyo, 〒1058640, JP)
OKAMOTO, Takahiro (9-2 Higashi-shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
International Classes:
C08G18/32; B24B37/00; C08J5/14; H01L21/304
Attorney, Agent or Firm:
OFUCHI, Michie et al. (2nd Floor, Ogikubo TM Bldg. 26-13, Ogikubo 5-chome, Suginami-k, Tokyo 51, 〒1670051, JP)
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