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Title:
POLYURETHANE MATRIX STONE GRINDING AND POLISHING PAD AND PREPARATION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/036502
Kind Code:
A1
Abstract:
A polyurethane matrix stone grinding and polishing pad and a preparation method thereof. The stone grinding and polishing pad relates to a novel stone grinding and polishing material made by preparing a polyurethane matrix and mixing therewith synthetic diamond powder, silicon carbide, silicon oxide, aluminum oxide, and a zinc oxide ultrafine powder as abrasive components. A density of the stone grinding and polishing material is 0.1 to 0.5 g/cm3, and a Shore A hardness thereof is 30 to 85. The polyurethane matrix has suitable foam walls and holes, and abrasive particles are mixed therein and distributed in a multi-dimensional structure of the polyurethane foam wall. The surface of a stone is ground under pressure and rotation of grinding equipment, while simultaneously, continuously and regularly releasing new sharp abrasive particles having a working face at a different layer. The abrasive particles have better self-sharpening performance, and thus have a higher grinding effect and efficiency.

Inventors:
WANG, Jianqiu (No. 14, Hongqi East Road Laishan Distric, Yantai Shandong 3, 264003, CN)
WANG, Wenting (No. 14, Hongqi East Road Laishan Distric, Yantai Shandong 3, 264003, CN)
Application Number:
CN2017/098586
Publication Date:
March 01, 2018
Filing Date:
August 23, 2017
Export Citation:
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Assignee:
WANG, Jianqiu (No. 14, Hongqi East Road Laishan Distric, Yantai Shandong 3, 264003, CN)
International Classes:
B24D18/00; C08L75/08
Attorney, Agent or Firm:
BEIJING JWT INTELLECTUAL PROPERTY CO., LTD. (WAN Xuetang, Suite 801 Tower 2, SoBoss Center,No. 16, South Sanhuan West Road, Fengtai District, Beijing 8, 100068, CN)
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