Title:
POLYVALENT PHENOL COMPOUND AND METHOD OF PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2018/052034
Kind Code:
A1
Abstract:
Provided is a polyvalent phenol compound that exhibits superior alkali resistance, without negatively affecting color, even when used as a resin feedstock material or developer. The polyvalent phenol compound contains less than 1.6 area%, in terms of 254 nm absorption intensity ratio, of a trisphenol compound (B) represented by the following formula (2) relative to a bisphenol compound (A) represented by the following formula (1) (wherein R1 is a monovalent aliphatic hydrocarbon radical comprising 6–24 carbon atoms; R2 and R3 are monovalent hydrocarbon radicals comprising 1–15 carbon atoms; and a and b are integers from 0 to 4) (wherein R1 is as defined in formula (1); R4, R5, and R6 are monovalent hydrocarbon radicals comprising 1–15 carbon atoms; and c, d, and e are integers from 0 to 4).
More Like This:
Inventors:
NAKAMURA TAKESHI (JP)
TAKAMI YOSHIE (JP)
MAEDA TOMOKO (JP)
SUMITANI NAOKO (JP)
SHIBATA HIROKI (JP)
MONDEN TOSHIKI (JP)
TAKAMI YOSHIE (JP)
MAEDA TOMOKO (JP)
SUMITANI NAOKO (JP)
SHIBATA HIROKI (JP)
MONDEN TOSHIKI (JP)
Application Number:
PCT/JP2017/033096
Publication Date:
March 22, 2018
Filing Date:
September 13, 2017
Export Citation:
Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
C08G64/04; C07C37/20; C07C37/84; C07C39/16; C08G59/06
Foreign References:
| JPS59167528A | 1984-09-21 | |||
| JPH08245465A | 1996-09-24 | |||
| JP2011080025A | 2011-04-21 | |||
| JP2000043412A | 2000-02-15 | |||
| JP2015212245A | 2015-11-26 | |||
| JPS53116357A | 1978-10-11 | |||
| JP2004145201A | 2004-05-20 | |||
| JP2002169249A | 2002-06-14 | |||
| JPH09301911A | 1997-11-25 |
Other References:
See also references of EP 3514193A4
Attorney, Agent or Firm:
KAWAGUCHI, Yoshiyuki et al. (JP)
Download PDF: