Title:
POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2001/053357
Kind Code:
A1
Abstract:
A polyvinyl acetal resin for use in heat-developable photosensitive materials which gives a coating solution having an excellent pot life and enables a heat-developable photosensitive material to have excellent image characteristics free from coloration, blurring, gradation failures, sensitivity insufficiency, poor raw-stock storage stability, etc. The polyvinyl acetal resin for heat-developable photosensitive materials is one synthesized from polyvinyl alcohol and an aldehyde through acetalization, has a degree of polymerization of 200 to 3,000, and has a residual acetyl group content of 0 to 25 mol% and a residual hydroxyl group content of 17 to 35 mol% when each acetal group is regarded as two acetalized hydroxyl groups. It has a water content of 2.5 wt.% or lower and a residual aldehyde content of 10 ppm or lower. It contains no antioxidant.
Inventors:
MIYAKE YOSHITAKA (JP)
Application Number:
PCT/JP2001/000337
Publication Date:
July 26, 2001
Filing Date:
January 19, 2001
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD (JP)
MIYAKE YOSHITAKA (JP)
MIYAKE YOSHITAKA (JP)
International Classes:
C08F8/28; C08L29/14; C09D129/14; G03C1/498; (IPC1-7): C08F8/28; C08F16/38; C08L29/14; G03C1/498
Foreign References:
| JPH05140211A | 1993-06-08 | |||
| JPH05155915A | 1993-06-22 | |||
| JPH10338713A | 1998-12-22 |
Other References:
See also references of EP 1270608A4
Attorney, Agent or Firm:
Yasutomi, Yasuo (Nishinakajima 5-chome Yodogawa-ku Osaka-shi, Osaka, JP)
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