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Patent Searching and Data


Title:
POLYVINYL ALCOHOL VAPOR-DEPOSITED FILM
Document Type and Number:
WIPO Patent Application WO/2013/125564
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a vapor-deposited film with which it is possible to suppress the formation of pinholes and cracks due to bending during vapor-deposited film processing such as lamination, and thus prevent a reduction in the gas barrier property. The present invention is a vapor-deposited film comprising a base film that includes a polyvinyl alcohol copolymer, and a metal vapor-deposited layer laminated on the base film, said vapor-deposited film being characterized in that the average particle diameter is 150 nm or less as measured at the metal vapor-deposited layer using an electron microscope. The average thickness of the metal vapor-deposited layer is preferably 30 nm to 100 nm.

Inventors:
NONAKA YASUHIRO (JP)
KAWAI HIROSHI (JP)
YAMAKOSHI SATOSHI (JP)
Application Number:
PCT/JP2013/054138
Publication Date:
August 29, 2013
Filing Date:
February 20, 2013
Export Citation:
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Assignee:
KURARAY CO (JP)
International Classes:
B32B15/082; B32B27/30; B65D65/40; F16L59/06
Domestic Patent References:
WO2008044549A12008-04-17
Foreign References:
JPH10122477A1998-05-15
JP2006266348A2006-10-05
JPS59106958A1984-06-20
JP3675904B22005-07-27
JPS6325615B21988-05-26
JPS61281147A1986-12-11
JP2002310385A2002-10-23
JP2005290108A2005-10-20
Other References:
See also references of EP 2818316A4
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
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Claims: