Title:
POSITION MEASURING METHOD, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2003/069276
Kind Code:
A1
Abstract:
A position measuring method capable of correctly measuring the position information of a mark even if only part of the mark can be observed via an observation visual field or the mark is out of an observation visual field. An observation system used has observation visual fields (PFx, PFy) that permit the observation of part of a mark (M) but does not permit the observation of the entire mark (M). A plurality of regions (S1, S2, S3, ....) on an object are imaged so as to include at least one region in which the mark (M) is partially observed via the observation visual fields (PFx, PFy) of the observation system, which part of the mark (M) the part of the mark (M) to be imaged belongs to is specified based on the imaged results, and the position information of the mark (M) is determined based on the partially imaged results of the mark (M) and the specified result.
Inventors:
KOKUMAI YUJI (JP)
Application Number:
PCT/JP2003/001567
Publication Date:
August 21, 2003
Filing Date:
February 14, 2003
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
KOKUMAI YUJI (JP)
KOKUMAI YUJI (JP)
International Classes:
G01B11/27; G03F9/00; (IPC1-7): G01B11/00; G03F9/00; H01L21/027
Domestic Patent References:
| WO1999004417A1 | 1999-01-28 |
Foreign References:
| US5721605A | 1998-02-24 | |||
| US5849441A | 1998-12-15 | |||
| JP2001343215A | 2001-12-14 |
Attorney, Agent or Firm:
Shiga, Masatake (2-3-1 Yaesu Chuo-ku, Tokyo, JP)
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