POSITION MEASURING METHOD, EXPOSURE METHOD AND SYSTEM THEREOF, DEVICE PRODUCTION METHOD

Title:

POSITION MEASURING METHOD, EXPOSURE METHOD AND SYSTEM THEREOF, DEVICE PRODUCTION METHOD

Document Type and Number:

WIPO Patent Application WO/2002/049083

Kind Code:

A1

Abstract:

Effects by mask-specific characteristics are minimized and an accuracy with which to measure a mark position is improved. A mask mark RM1 is positioned within an observation visual field in an observation system, any one of a plurality of reference marks FMa, FMb is selectively positioned within an observation visual field based on characteristics with respect to a lighting beam of the mask mark RM1, and position information on the mask mark RM1 relative to a reference mark WFM1 is determined based on the observation results.

Inventors:

TAKAHASHI AKIRA (JP)

Application Number:

PCT/JP2001/010781

Publication Date:

June 20, 2002

Filing Date:

December 10, 2001

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Assignee:

NIPPON KOGAKU KK (JP)
TAKAHASHI AKIRA (JP)

International Classes:

G03F9/00; (IPC1-7): H01L21/027

Foreign References:

JPH0883748A	1996-03-26
JPH04165363A	1992-06-11

Attorney, Agent or Firm:

Shiga, Masatake (23-3 Takadanobaba 3-chom, Shinjuku-ku Tokyo, JP)

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