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Title:
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE LITHOGRAPHIC PRINTING ORIGINAL PLATE AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2017/145717
Kind Code:
A1
Abstract:
A positive photosensitive resin composition which is characterized by containing an infrared absorbent and a polyester that has a sulfonamide group in the main chain; a positive lithographic printing original plate which uses this positive photosensitive resin composition; and a method for producing a lithographic printing plate.

Inventors:
YASUHARA YUICHI (JP)
NOZAKI ATSUYASU (JP)
Application Number:
PCT/JP2017/004121
Publication Date:
August 31, 2017
Filing Date:
February 03, 2017
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08G63/688; G03F7/00; G03F7/004; G03F7/095; G03F7/11; G03F7/32
Foreign References:
JP2005099138A2005-04-14
JP2011197308A2011-10-06
JP2005060685A2005-03-10
JP2005106910A2005-04-21
JPH02156241A1990-06-15
Other References:
See also references of EP 3392710A4
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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