POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

WIPO Patent Application WO/2013/100298

A1

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.

KWON JI-YUN (KR)
LEE JONG-HWA (KR)
CHO HYUN-YONG (KR)
KIM DAE-YUN (KR)
KIM SANG-KYEON (KR)
KIM SANG-KYUN (KR)
KIM SANG-SOO (KR)
YOON EUN-KYUNG (KR)
LEE JUN-HO (KR)
LEE JIN-YOUNG (KR)
CHEON HWAN-SUNG (KR)
HONG CHUNG-BEOM (KR)
HWANG EUN-HA (KR)

PCT/KR2012/005691

July 04, 2013

July 17, 2012

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CHEIL IND INC (KR)
KWON JI-YUN (KR)
LEE JONG-HWA (KR)
CHO HYUN-YONG (KR)
KIM DAE-YUN (KR)
KIM SANG-KYEON (KR)
KIM SANG-KYUN (KR)
KIM SANG-SOO (KR)
YOON EUN-KYUNG (KR)
LEE JUN-HO (KR)
LEE JIN-YOUNG (KR)
CHEON HWAN-SUNG (KR)
HONG CHUNG-BEOM (KR)
HWANG EUN-HA (KR)

G03F7/022; G02F1/13; G03F7/004

KR20040087918A	2004-10-15
KR20110054465A	2011-05-25
KR20020002318A	2002-01-09
KR20020002319A	2002-01-09

PANKOREA PATENT AND LAW FIRM (823-16 Yeoksam-dong Gangnam-gu, Seoul 135-080, KR)

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