Title:
POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2007/148623
Kind Code:
A1
Abstract:
A positive resist composition comprising a resin component (A) whose alkali solubility can be increased by the action of an acid, wherein the resin component (A) comprises a resin (A1) which has a constitutional unit (a0) represented by the general formula (a0-1) and a constitutional unit (a1) derived from an acrylate ester having an acid-dissociating dissociation inhibitory group, in which a constituent unit or units other than the constituent unit (a0) is derived from an acrylate ester.
Inventors:
IWAI TAKESHI (JP)
IRIE MAKIKO (JP)
NAKAYAMA KAZUHIKO (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
NISHIMAE YUICHI (JP)
IRIE MAKIKO (JP)
NAKAYAMA KAZUHIKO (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
NISHIMAE YUICHI (JP)
Application Number:
PCT/JP2007/062112
Publication Date:
December 27, 2007
Filing Date:
June 15, 2007
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
IWAI TAKESHI (JP)
IRIE MAKIKO (JP)
NAKAYAMA KAZUHIKO (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
NISHIMAE YUICHI (JP)
IWAI TAKESHI (JP)
IRIE MAKIKO (JP)
NAKAYAMA KAZUHIKO (JP)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
NISHIMAE YUICHI (JP)
International Classes:
G03F7/039; G03F7/004; G03F7/38; H01L21/027
Domestic Patent References:
| WO2006013687A1 | 2006-02-09 |
Foreign References:
| JP2006011374A | 2006-01-12 | |||
| JP2006011373A | 2006-01-12 | |||
| JP2006011250A | 2006-01-12 | |||
| JPH11258803A | 1999-09-24 | |||
| JPH01163736A | 1989-06-28 | |||
| JPS61251652A | 1986-11-08 |
Attorney, Agent or Firm:
TANAI, Sumio et al. (Yaesu Chuo-ku Tokyo, 53, JP)
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