POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION

Title:

POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION

Document Type and Number:

WIPO Patent Application WO/2006/003800

Kind Code:

A1

Abstract:

A positive-working resist composition of a wide level of DOF and a method for resist pattern formation are provided. This composition is a positive-working resist composition comprising a resin component (A) which, upon action by an acid, increases alkali solubility and an acid generating agent component (B) which produces an acid upon exposure. The component (A) is a copolymer comprising n (n = an integer of 4 to 6) types of constitutional units different from each other in structure, and the proportion of each constitutional unit in the copolymer is more than 0% by mole and not more than 100/(n - 1)% by mole.

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Inventors:

HAYASHI RYOTARO (JP)
YAMADA SATOSHI (JP)
IRIE MAKIKO (JP)

Application Number:

PCT/JP2005/011148

Publication Date:

January 12, 2006

Filing Date:

June 17, 2005

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)
HAYASHI RYOTARO (JP)
YAMADA SATOSHI (JP)
IRIE MAKIKO (JP)

International Classes:

G03F7/033; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; G03F7/033; H01L21/027

Foreign References:

JP2003223001A	2003-08-08
JP2003167347A	2003-06-13
JP2003005375A	2003-01-08
JP2004310075A	2004-11-04

Attorney, Agent or Firm:

Tanai, Sumio (Yaesu Chuo-ku, Tokyo 53, JP)

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