Title:
POWER CONTROL METHOD AND APPARATUS FOR LOWER RADIO FREQUENCY POWER SOURCE, AND SEMICONDUCTOR PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/045944
Kind Code:
A9
Abstract:
Provided in the present disclosure are a power control method and apparatus for a lower radio frequency power source, and a semiconductor processing device, the method comprising: when a process chamber starts to perform a semiconductor process, using a preset power compensation relationship equation and on the basis of a pre-acquired first radio frequency loop parameter group of a reference chamber and a second radio frequency loop parameter group of the process chamber currently performing the semiconductor process, acquiring a power compensation coefficient of the current process chamber relative to the reference chamber; on the basis of the power compensation coefficient and the power setting value of the lower radio frequency power source of the current process chamber, calculating a power compensation value of the current process chamber relative to the reference chamber; and controlling the output power compensation value of the lower radio frequency power source. The technical solution of the present invention can improve the consistency of the process results of different process chambers.
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Inventors:
WEI JING (CN)
CHEN XING (CN)
ZHANG YU (CN)
WEI GANG (CN)
SHAN GUODAO (CN)
ZHONG CHENYU (CN)
YOU YANYAN (CN)
YANG JING (CN)
CHEN XING (CN)
ZHANG YU (CN)
WEI GANG (CN)
SHAN GUODAO (CN)
ZHONG CHENYU (CN)
YOU YANYAN (CN)
YANG JING (CN)
Application Number:
PCT/CN2022/120101
Publication Date:
March 21, 2024
Filing Date:
September 21, 2022
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01J7/24
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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