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Patent Searching and Data


Title:
POWER SUPPLY DEVICE FOR PLASMA GENERATION
Document Type and Number:
WIPO Patent Application WO/2018/128236
Kind Code:
A1
Abstract:
Provided is a power supply device for plasma generation which supplies a high frequency signal amplified to have energy for plasma generation, the power supply device comprising: a frequency generator for generating a signal having a frequency of the high frequency signal; a power amplifier for amplifying power of the signal generated from the frequency generator, and providing same to an output terminal of the power supply device; a voltage/electric current sensor for detecting a voltage and an electric current of the high frequency signal outputted from the power amplifier, and a phase difference between the voltage and the electric current; a variable impedance element unit connected between the power amplifier and the output terminal and comprising a plurality of variable passive elements; and an impedance adjuster for deriving the impedance of a load connected the output terminal, on the basis of the voltage, electric current and phase difference detected by the voltage/electric current sensor, and adjusting the impedance of the variable passive elements on the basis of the impedance of the load.

Inventors:
PARK, Seung Jin (906-3203, 276 Dongtandaerosibeom-gil,Hwaseong-si, Gyeonggi-do, 18477, KR)
KWON, Soon Ku (316 77, Cheongam-ro Nam-gu,Pohang-si, Gyeongsangbuk-do, 37673, KR)
Application Number:
KR2017/007908
Publication Date:
July 12, 2018
Filing Date:
July 21, 2017
Export Citation:
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Assignee:
MEDIPL CO., LTD. (903 8, Seongnam-daero 331beon-gil Bundang-gu,Seongnam-si, Gyeonggi-do, 13558, KR)
International Classes:
H01J37/32; H03H7/38; H05H1/46
Foreign References:
KR20160044428A2016-04-25
KR20020047229A2002-06-21
US20040007984A12004-01-15
KR100907438B12009-07-14
KR20160012085A2016-02-02
Attorney, Agent or Firm:
YOU ME PATENT AND LAW FIRM (115 Teheran-ro, Gangnam-gu, Seoul, 06134, KR)
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