Title:
POWER SUPPLY VOLTAGE DETERMINATION METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT AND POWER SUPPLY VOLTAGE CONTROL SYSTEM FOR SEMICONDUCTOR INTEGRATED CIRCUIT
Document Type and Number:
WIPO Patent Application WO/2011/114416
Kind Code:
A1
Abstract:
Provided are a power supply voltage determination method for a semiconductor integrated circuit and a power supply voltage control system for the semiconductor integrated circuit. In the power supply voltage determination method for a semiconductor integrated circuit, a power supply voltage of the integrated circuit is determined as follows: using a plurality of cell libraries constituting the semiconductor integrated circuit and process variation information, the characteristic variation of each cell included in the cell libraries is statistically analyzed; the sensitivities and mutual dependency of a plurality of parameters causing the characteristic variation of the delay time of the each cell are calculated; a characteristic monitoring circuit is mounted and a database is created in which the delay times of the all signal transmission paths in the semiconductor integrated circuit are stored; a map is created that indicates a relationship between the plurality of parameters causing the characteristic variation and the optimum power supply voltage of the semiconductor integrated circuit; using the inverse function of the response surface of a cell constituting a plurality of delay circuits, the plurality of parameters causing the characteristic variation are estimated from the output of the characteristic monitoring circuit; and the power supply voltage of the semiconductor integrated circuit is determined using the map and the estimated plurality of parameters causing the characteristic variation.
Inventors:
FUDANUKI Nobuo (1-1-26 Irifune, Cyuo-k, Tokyo 42, 〒1040042, JP)
札抜 宣夫 (〒42 東京都中央区入船１丁目１番２６号 ケイレックス・テクノロジー株式会社内 Tokyo, 〒1040042, JP)
HIRAI Yoshiyuki (1-1-26 Irifune, Cyuo-k, Tokyo 42, 〒1040042, JP)
札抜 宣夫 (〒42 東京都中央区入船１丁目１番２６号 ケイレックス・テクノロジー株式会社内 Tokyo, 〒1040042, JP)
HIRAI Yoshiyuki (1-1-26 Irifune, Cyuo-k, Tokyo 42, 〒1040042, JP)
Application Number:
JP2010/054302
Publication Date:
September 22, 2011
Filing Date:
March 15, 2010
Export Citation:
Assignee:
KEIREX TECHNOLOGY INC. (1-1-26, Irifune Cyuo-k, Tokyo 42, 〒1040042, JP)
ケイレックス・テクノロジー株式会社 (〒42 東京都中央区入船１丁目１番２６号 Tokyo, 〒1040042, JP)
FUDANUKI Nobuo (1-1-26 Irifune, Cyuo-k, Tokyo 42, 〒1040042, JP)
札抜 宣夫 (〒42 東京都中央区入船１丁目１番２６号 ケイレックス・テクノロジー株式会社内 Tokyo, 〒1040042, JP)
ケイレックス・テクノロジー株式会社 (〒42 東京都中央区入船１丁目１番２６号 Tokyo, 〒1040042, JP)
FUDANUKI Nobuo (1-1-26 Irifune, Cyuo-k, Tokyo 42, 〒1040042, JP)
札抜 宣夫 (〒42 東京都中央区入船１丁目１番２６号 ケイレックス・テクノロジー株式会社内 Tokyo, 〒1040042, JP)
International Classes:
H01L21/82; G05F1/10; H01L21/822; H01L27/04
Attorney, Agent or Firm:
Takahashi, Hayashi and Partner Patent Attorneys, Inc. (Sonpo Japan Kamata Building 9F, 5-24-2 Kamata Ota-k, Tokyo 52, 〒1440052, JP)
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