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Title:
PRECURSOR MATERIAL DELIVERY SYSTEM FOR ATOMIC LAYER DEPOSITION
Document Type and Number:
WIPO Patent Application WO2004024981
Kind Code:
A3
Abstract:
A precursor delivery system (100) includes a flow path (104) from a precursor container (102) to a reaction space (110) of a thin film deposition system, such as an atomic layer deposition reactor. A staging volume (114) is preferably between precursor container (102) and reaction space (110) for receiving at least one dose of precursor material from precursor container (102), from which a series of pulses is released toward reaction space (110). Precursor material is typically vaporized after loading in precursor container (102), by heating or reducing the pressure inside precursor container (102). A vacuum line (156) preferably coupled to precursor container (102) bypasses reaction space (110) for reducing pressure inside precursor container (102) without drawing particles into reaction space (110). A high conductivity particle filter having inertial traps may be included, preferably between precursor container (102) and a staging volume (114), for filtering particles from the precursor material.

Inventors:
AITCHISON BRADLEY J (US)
MAULA JARMO (FI)
LESKINEN HANNU (FI)
LANG TEEMU (FI)
KUOSMANEN PEKKA (FI)
HAERKOENEN KARI (FI)
SONNINEN MARTTI (FI)
Application Number:
US0328436W
Publication Date:
July 29, 2004
Filing Date:
September 10, 2003
Export Citation:
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Assignee:
PLANAR SYSTEMS, INC.
AITCHISON, BRADLEY, J.
MAULA, JARMO
LESKINEN, HANNU
LANG, TEEMU
KUOSMANEN, PEKKA
HAERKOENEN, KARI
SONNINEN, MARTTI
International Classes:
C23C16/44; C30B25/14; (IPC1-7): C23C16/44; C23C16/455; C30B25/14
Domestic Patent References:
WO2001045158A12001-06-21
Foreign References:
US20010054377A12001-12-27
US20010042523A12001-11-22
US6210485B12001-04-03
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