PRECURSOR MATERIAL DELIVERY SYSTEM FOR ATOMIC LAYER DEPOSITION

WIPO Patent Application WO2004024981

A3

A precursor delivery system (100) includes a flow path (104) from a precursor container (102) to a reaction space (110) of a thin film deposition system, such as an atomic layer deposition reactor. A staging volume (114) is preferably between precursor container (102) and reaction space (110) for receiving at least one dose of precursor material from precursor container (102), from which a series of pulses is released toward reaction space (110). Precursor material is typically vaporized after loading in precursor container (102), by heating or reducing the pressure inside precursor container (102). A vacuum line (156) preferably coupled to precursor container (102) bypasses reaction space (110) for reducing pressure inside precursor container (102) without drawing particles into reaction space (110). A high conductivity particle filter having inertial traps may be included, preferably between precursor container (102) and a staging volume (114), for filtering particles from the precursor material.

AITCHISON BRADLEY J (US)
MAULA JARMO (FI)
LESKINEN HANNU (FI)
LANG TEEMU (FI)
KUOSMANEN PEKKA (FI)
HAERKOENEN KARI (FI)
SONNINEN MARTTI (FI)

PCT/US2003/028436

July 29, 2004

September 10, 2003

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PLANAR SYSTEMS INC (US)
AITCHISON BRADLEY J (US)
MAULA JARMO (FI)
LESKINEN HANNU (FI)
LANG TEEMU (FI)
KUOSMANEN PEKKA (FI)
HAERKOENEN KARI (FI)
SONNINEN MARTTI (FI)

C23C16/44; C30B25/14; (IPC1-7): C23C16/44; C23C16/455; C30B25/14

WO2001045158A1

2001-06-21

US20010054377A1	2001-12-27
US20010042523A1	2001-11-22
US6210485B1	2001-04-03

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