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Title:
PRECURSORS AND METHODS FOR THE ATOMIC LAYER DEPOSITION OF MANGANESE
Document Type and Number:
WIPO Patent Application WO/2012/125439
Kind Code:
A3
Abstract:
Methods and precursors are provided for deposition of elemental manganese films on surfaces using metal coordination complexes comprising an eta-3-bound monoanionic four-electron donor ligands selected from amidinate, mixed ene-amido and allyl, or eta-2 bound amidinate ligand. The ligands are selected from amidinate, ene-amido, and allyl.

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Inventors:
THOMPSON DAVID (US)
ANTHIS JEFFREY W (US)
Application Number:
PCT/US2012/028421
Publication Date:
December 06, 2012
Filing Date:
March 09, 2012
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
THOMPSON DAVID (US)
ANTHIS JEFFREY W (US)
International Classes:
C07F13/00; C07B61/00; C23C16/18
Foreign References:
US7737290B22010-06-15
US20080026576A12008-01-31
Other References:
SCHMIDT, J. A. R. ET AL.: "First-row Transition Metal Complexes of Sterically-hindered Amidinates.", J. CHEM. SOC. DALTON TRANS., 2002, pages 3454 - 3461
LIM, B. S. ET AL.: "Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates.", INORG. CHEM., vol. 42, 2003, pages 7951 - 7958
Attorney, Agent or Firm:
CRISTALDI, Michelle A. (33 Wood Avenue South Second Floor Suite 21, Iselin New Jersey, US)
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