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Patent Searching and Data


Title:
PREPARATION METHOD OF COMPOUND SEMICONDUCTOR THIN-FILM MATERIAL
Document Type and Number:
WIPO Patent Application WO/2016/101388
Kind Code:
A1
Abstract:
The present invention relates to a preparation method of a compound semiconductor thin-film material. A large-scale preparation of the compound semiconductor target thin-film material can be realized via a one-step method of the present invention, preparing a plurality of thin films at once, having a short preparation period, a high preparation efficiency and a low preparation cost, being well adapted to a substrate (base sheet) material without requiring special processing of the substrate (base sheet) thereof; the compound semiconductor thin-film material prepared via a two-step method has a high purity and good crystallinity; a sealing system is employed in the preparation process, thus avoiding raw material loss caused by sublimation, and having high process controllability; and the preparation temperature is lower, thus reducing energy consumption.

Inventors:
LIU XINGQUAN (CN)
LIU YIDING (CN)
ZHANG MINGJU (CN)
ZHANG ZHENG (CN)
ZHAO HONGYUAN (CN)
HE YONGCHENG (CN)
ZHANG HUAIWU (CN)
Application Number:
PCT/CN2015/072140
Publication Date:
June 30, 2016
Filing Date:
February 03, 2015
Export Citation:
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Assignee:
UNIV ELECTRONIC SCIENCE & TECH (CN)
International Classes:
C23C16/44; C23C14/06; C23C14/24; C23C16/30
Foreign References:
CN103820771A2014-05-28
CN103866379A2014-06-18
CN103911600A2014-07-09
CN103147038A2013-06-12
CN103159193A2013-06-19
CN103173715A2013-06-26
Attorney, Agent or Firm:
BEIJING ZHCC INTELLECTUAL PROPERTY CO.,LTD (CN)
北京众合诚成知识产权代理有限公司 (CN)
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