Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PREPARATION METHOD FOR GRID LINE, PREPARATION METHOD FOR CELL SHEET, AND PHOTOVOLTAIC CELL
Document Type and Number:
WIPO Patent Application WO/2023/232057
Kind Code:
A1
Abstract:
Disclosed in the present invention are a preparation method for a grid line, a preparation method for a cell sheet, and a photovoltaic cell. The preparation method for a grid line comprises the following steps: coating the front face and/or back face of a cell sheet with a mask material, such that the mask material is cured to form a mask; exposing a local area of the mask according to the properties of the mask, so as to form a development reaction area with a width gradient on the mask; and developing the mask in the development reaction area, so as to form a mask opening with a width gradient in the development reaction area; electroplating metal in the mask opening, so as to form a grid line with a width gradient; and removing the mask. By means of the preparation method for a grid line in the embodiments of the present invention, a grid line with a width gradient can be formed on a cell sheet, and after the grid line with a width gradient is packaged into a photovoltaic assembly, the power generation efficiency can be improved.

Inventors:
YAO YU (CN)
LI ZHONGTIAN (CN)
Application Number:
PCT/CN2023/097324
Publication Date:
December 07, 2023
Filing Date:
May 31, 2023
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUZHOU SUNWELL NEW ENERGY CO LTD (CN)
International Classes:
H01L31/18; H01L31/0224; H01L31/054
Domestic Patent References:
WO2013030991A12013-03-07
Foreign References:
CN217361599U2022-09-02
CN102820376A2012-12-12
CN101807615A2010-08-18
CN103400869A2013-11-20
CN103824894A2014-05-28
US20100252094A12010-10-07
CN110190140A2019-08-30
Download PDF: