Title:
PREPARATION METHOD FOR GROOVE HAVING ARC-SHAPED BASE ANGLE, AND PREPARATION METHOD FOR MEMS MICROPHONE
Document Type and Number:
WIPO Patent Application WO/2023/078137
Kind Code:
A1
Abstract:
Provided in the present invention are a preparation method for a groove having an arc-shaped base angle, and a preparation method for a MEMS microphone. A groove pattern in a photoresist layer can be accurately copied, by means of a plasma etching process, into a layer to be etched, and a photoresist material of the photoresist layer extends towards a window as etching progresses, such that the opening size of the window is automatically reduced, and a groove having an arc-shaped base angle can thus be gradually formed as the photoresist material extends. It can be seen that by means of the preparation method for the groove provided by the present invention, not only can the size of the formed groove be accurately controlled, but an arc-shaped base angle can also be automatically formed.
Inventors:
CHEN JIAWEI (CN)
SONG JIAN (CN)
SONG JIAN (CN)
Application Number:
PCT/CN2022/127652
Publication Date:
May 11, 2023
Filing Date:
October 26, 2022
Export Citation:
Assignee:
SEMICONDUCTOR MFG ELECTRONICS SHAOXING CORP (CN)
International Classes:
H04R31/00; H04R19/00; H04R19/04
Foreign References:
| CN113766412A | 2021-12-07 | |||
| US20060063348A1 | 2006-03-23 | |||
| US4645562A | 1987-02-24 | |||
| US20100258524A1 | 2010-10-14 | |||
| US5843226A | 1998-12-01 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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