Title:
PREPARATION METHOD OF PATTERNED SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/054768
Kind Code:
A1
Abstract:
The present application relates to a method for preparing a patterned substrate. According to the method of the present application, in a process of transferring a self-assembled pattern of a block copolymer on a substrate to form a pattern, the self-assembled pattern of the block copolymer can be efficiently and accurately transferred on the substrate to prepare a patterned substrate.
Inventors:
RYU HYUNG JU (KR)
YOON SUNG SOO (KR)
KU SE JIN (KR)
YOON SUNG SOO (KR)
KU SE JIN (KR)
Application Number:
PCT/KR2018/010749
Publication Date:
March 21, 2019
Filing Date:
September 13, 2018
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
G03F7/004; C08L33/12; G03F1/80; H01L21/027
Domestic Patent References:
| WO2017042312A1 | 2017-03-16 | |||
| WO2017068259A1 | 2017-04-27 |
Foreign References:
| KR20160038707A | 2016-04-07 | |||
| JP2004119839A | 2004-04-15 | |||
| KR20150113438A | 2015-10-08 |
Other References:
TING, YUK-HONG ET AL.: "Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography", JOURNAL OF VACUU, SCIENCE AND TECHNOLOGY, PART B, vol. 26, no. 5, 5 September 2008 (2008-09-05), pages 1684 - 1689, XP012114351, DOI: doi:10.1116/1.2966433
BORAH, D. ET AL.: "Plasma etch technologies for the development of ultra -small feature size transistor devices", JOURNAL OF PHYSICS D: APPLIED PHYSICS, vol. 44, 14 April 2011 (2011-04-14), pages 1 - 12, XP020189703, DOI: doi:10.1088/0022-3727/44/17/174012
See also references of EP 3665531A4
BORAH, D. ET AL.: "Plasma etch technologies for the development of ultra -small feature size transistor devices", JOURNAL OF PHYSICS D: APPLIED PHYSICS, vol. 44, 14 April 2011 (2011-04-14), pages 1 - 12, XP020189703, DOI: doi:10.1088/0022-3727/44/17/174012
See also references of EP 3665531A4
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
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