PREPARATION METHOD FOR AND USE OF PHOTOSENSITIVE MATERIAL

WIPO Patent Application WO/2022/000369

A1

A preparation method for a photosensitive material, comprising dissolving a metal salt in a solvent, adding a ligand, and preparing a metal dot material by using a one-pot method; and then mixing same with a polymer monomer, spreading, and then performing ultraviolet light curing, so as to obtain the photosensitive material. As metal dots are stable, easy to synthesize, and can be mass-produced, and the structure is controllable, the coverage of a photosensitive region is wide, the toxicity is low, and the nanoscale size thereof can match with a flexible substrate, in the case of being dominant in all aspects, the effect of sensitization can be achieved by using a thin metal cluster layer to cover above the photosensitive layer, and in combination with the high carrier mobility of the photosensitive layer and the high light absorption rate of the sensitive layer, the light response capability of a device is greatly improved, and the demand for current large-size display is satisfied.

JPS524310	METHOD OF PRODUCING STAMPABLE INK
JP2007204543	PHOTOPOLYMERIZABLE RESIN COMPOSITION

MENG HONG (CN)
AI LIN (CN)
LIU ZHENGUO (CN)
GOTO OSAMU (CN)
HE GUFENG (CN)

PCT/CN2020/099736

January 06, 2022

July 01, 2020

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UNIV PEKING SHENZHEN GRADUATE SCHOOL (CN)

C08F2/48; C08F120/20; C08K5/37; H01G9/20

WO2018063382A1

2018-04-05

CN110579828A	2019-12-17
CN110305349A	2019-10-08
CN109652060A	2019-04-19
CN106957645A	2017-07-18
CN106905497A	2017-06-30
US20090286968A1	2009-11-19

SHENZHEN STANDARD PATENT & TRADEMARK AGENT LTD. (CN)

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