Title:
PRESSURE CONTROL DEVICE AND PRESSURE CONTROL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2017/170647
Kind Code:
A1
Abstract:
Provided are a pressure control device and a pressure control system with which the pressure within a chamber can be maintained at a constant level quickly even if the volume of the chamber relative to a gas control flow rate is large or a pipe between a flow rate control valve and the chamber is long. A pressure control device 1 comprises: a CPU 18 that subtracts, at a predetermined ratio, a flow rate signal from a set pressure signal when gas is being supplied into a chamber 3 in order to set the inside of the chamber 3 to a negative pressure; a comparator circuit 21 that compares a detected pressure signal indicating the pressure within the chamber 3 that was detected by a pressure sensor 4 and the set pressure signal from which the flow rate signal has been subtracted; and a valve drive circuit 22 that controls a flow rate control valve 14 on the basis of the comparison results obtained by the comparator circuit 21.
Inventors:
NOZAWA TAKAHIRO (JP)
KANAI YOSHITOMO (JP)
NAKAMURA TAKESHI (JP)
KANAI YOSHITOMO (JP)
NAKAMURA TAKESHI (JP)
Application Number:
PCT/JP2017/012823
Publication Date:
October 05, 2017
Filing Date:
March 29, 2017
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
G05D16/20; G05D7/06
Foreign References:
| JPH11154024A | 1999-06-08 | |||
| JPH07295657A | 1995-11-10 |
Attorney, Agent or Firm:
WILLFORT INTERNATIONAL PATENT FIRM (JP)
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