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Patent Searching and Data


Title:
PRESSURE REDUCING AND DRYING DEVICE AND PRESSURE REDUCING AND DRYING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/015006
Kind Code:
A1
Abstract:
A pressure reducing and drying device and a pressure reducing and drying method. The pressure reducing and drying device comprises: a working chamber (10), a workbench (21), air extraction holes (30), air inlet holes (40) and air inlet hole valves (50); the workbench (21) is provided in the working chamber (10), an air extraction hole (30) is provided at each of the four corners of the workbench (21), at least one air inlet hole (40) is provided corresponding to each air extraction hole (30) and adjacent to the latter, each air inlet hole (40) being provided with an air inlet hole valve (50); when extracting air through the air extraction holes (30), protective gases are introduced from the air inlet holes (40) to around the air extraction holes (30), decreasing the speed of extracting the volatilized photoresist solvent at the edges of the substrate through the air extraction holes (30), thereby improving the uniformity of volatilization of the photoresist solvent, avoiding the influence of non-uniform volatilization of the photoresist solvent on the line width in the development process, ensuring the uniformity of the line width in the development process.

Inventors:
GONG CHENGBO (CN)
Application Number:
PCT/CN2017/098166
Publication Date:
January 24, 2019
Filing Date:
August 18, 2017
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G02F1/133; G03C1/74; G03F7/38
Foreign References:
CN106597732A2017-04-26
CN106773169A2017-05-31
CN103707451A2014-04-09
CN105091506A2015-11-25
CN105783438A2016-07-20
CN205762150U2016-12-07
CN1945437A2007-04-11
CN202067075U2011-12-07
JP2003154303A2003-05-27
JP2004186419A2004-07-02
JP2006071185A2006-03-16
JP2011114055A2011-06-09
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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