PRESSURE REDUCTION PROCESS DEVICE, PRESSURE REDUCTION PROCESS METHOD, AND PRESSURE REGULATION VALVE

WIPO Patent Application WO/2005/004219

A1

A pressure reduction process device having no possibility of leakage at a valve provided in an air discharge path when the valve is closed and capable of reducing a load of maintenance work. On an air discharge tube (3) connected to a reaction tube (1) is provided a gate valve (4) for air-tightly closing the tube. A purge gas is jetted from jetting mouths, arranged along the circumferential direction in the valve seat and in the valve body, into a gap between a valve seat and a valve body in the gate valve. This prevents foreign objects originated from a process gas from adhering on those surfaces of the valve seat and the valve body that face the gap between the valve seat and valve body, improving sealing capability of the gate valve.

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MATSUURA HIROYUKI (JP)

PCT/JP2004/009440

January 13, 2005

July 02, 2004

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TOKYO ELECTRON LTD (JP)
MATSUURA HIROYUKI (JP)

C23C16/44; F16K25/02; F16K51/02; H01L21/31; (IPC1-7): H01L21/31; F16K51/02; C23C16/44

JPH08285132A	1996-11-01
JPH11214317A	1999-08-06
JPH11195649A	1999-07-21
JPS56105183A	1981-08-21
JPH0989139A	1997-03-31
JPH11325313A	1999-11-26
JPH08285133A	1996-11-01

Yoshitake, Kenji (Room 323 Fuji Bldg., 2-3, Marunouchi 3-chom, Chiyoda-ku Tokyo 05, JP)

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