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Title:
PRESSURE-SWING-ADSORPTION GAS PRODUCING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/169689
Kind Code:
A1
Abstract:
Provided is a pressure-swing-adsorption gas producing apparatus in which the concentration of a gas being purified that is exhausted from an adsorption tower can be maintained at an appropriate concentration while an appropriate operation state is maintained. A membrane separation unit 9, which has a separation membrane 9A through which a miscellaneous gas passes quickly relative to a gas being purified, and a pressure-boosting unit 10 that boosts the pressure of an off-gas and feeds the off-gas to the membrane separation unit 9 are provided to an off-gas exhaust path 4 connected to multiple adsorption towers 1. A recycle gas return path 11 that returns a recycle gas that does not pass through the separation membrane 9A to a feedstock gas supply path 3 is provided. When the adsorption time for carrying out an adsorption step is changed or adjusted, an operation control unit sets the supply rate at which the off-gas is supplied from the pressure-boosting unit 10 to the membrane separation unit 9 to a flow-rate at which the off-gas amount exhausted from an adsorption tower 1 before the adsorption time is changed is equal to the off-gas amount supplied from the pressure-boosting unit 10 to the membrane separation unit 9, after the adsorption time is changed, between the start of a desorption step at an adsorption tower 1 and the start of a desorption step at a separate adsorption tower 1.

Inventors:
TANAKA HIROSHI (JP)
YOKOYAMA KOTA (JP)
Application Number:
PCT/JP2017/009955
Publication Date:
October 05, 2017
Filing Date:
March 13, 2017
Export Citation:
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Assignee:
OSAKA GAS CO LTD (JP)
International Classes:
B01D53/047; B01D53/22; C07C7/12; C07C7/144; C07C9/04
Domestic Patent References:
WO2014104196A12014-07-03
Foreign References:
JPS5651223A1981-05-08
JP2008247632A2008-10-16
JPS6447421A1989-02-21
US5753010A1998-05-19
JPS6391119A1988-04-21
JPH0312212A1991-01-21
Attorney, Agent or Firm:
R&C IP LAW FIRM (JP)
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