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Patent Searching and Data


Title:
PRINTING MASK PLATE AND METHOD FOR PRINTING COLLOIDAL PATTERNS
Document Type and Number:
WIPO Patent Application WO/2019/007057
Kind Code:
A1
Abstract:
A printing mask plate, comprising: a silk screen (2), the silk screen (2) comprising an annular penetrating region (21) allowing a colloid (21) to penetrate and a blocking region (22) which surrounds the annular penetrating region (21) and blocks the colloid (4) from penetrating through same, the annular penetrating region (21) comprising an adjusting sub-region (21a) for increasing the penetration amount of the colloid (4), and the blocking region (22) comprising blocking sub-regions (22a) which are positioned on the inner side and the outer side of the corresponding adjusting sub-region (21a), respectively; a first film layer (23) which covers one side of the blocking region (22); and a second film layer (24) which covers one side of the blocking sub-region (22a) away from the first film layer (23). Also disclosed is a method for printing colloidal patterns by using the printing mask plate.

Inventors:
ZHANG LIANG (CN)
CHEN XU (CN)
HUANG CHUN-CHIEH (CN)
BAO SHANSHAN (CN)
Application Number:
PCT/CN2018/075416
Publication Date:
January 10, 2019
Filing Date:
February 06, 2018
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
B41F15/36
Domestic Patent References:
WO2016019274A12016-02-04
Foreign References:
CN107264008A2017-10-20
CN104332450A2015-02-04
CN105116687A2015-12-02
JP2016129954A2016-07-21
CN1564755A2005-01-12
Attorney, Agent or Firm:
CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)
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