PROCESS AND APPARATUS FOR PLASMA COATING, SUBSTRATES COATED BY THIS METOD OR APPARATUS

WIPO Patent Application WO2005110626

A3

A method for forming an active material containing coating on a substrate, which method comprises the steps of: i) introducing one or more gaseous or atomised liquid and/or solid coating-forming materials which undergo chemical bond forming reactions within a plasma environment and one or more active materials which substantially do not undergo chemical bond forming reactions within a plasma environment, into an atmospheric or low pressure non-thermal equilibrium plasma discharge and/or an excited gas stream resulting therefrom, and ii) exposing the substrate to the resulting mixture of atomised coating-forming and at least one active material which are deposited onto the substrate surface to form a coating; wherein the substrate is not a wipe, cloth or sponge for household care or depilatory care or a water solute household cleaning unit dose product.

GOODWIN ANDREW JAMES (IE)
LEADLEY STUART ROBERT (IE)
O'NEILL LIAM (IE)
DUFFIELD PAUL JOHN (GB)
MCKECHNIE MALCOLM TOM (GB)
PUGH SIMON (GB)

PCT/GB2005/001828

April 20, 2006

May 13, 2005

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DOW CORNING IRELAND LTD (IE)
GOODWIN ANDREW JAMES (IE)
LEADLEY STUART ROBERT (IE)
O'NEILL LIAM (IE)
DUFFIELD PAUL JOHN (GB)
MCKECHNIE MALCOLM TOM (GB)
PUGH SIMON (GB)

A01N33/12; A61L15/00; B05D7/24; D06M10/02; D06M10/10; D06M14/32

US6228436B1	2001-05-08
US6539890B1	2003-04-01
US20030148139A1	2003-08-07
DE19738190A1	1999-03-04
US4422915A	1983-12-27
US6613393B1	2003-09-02
US20020015726A1	2002-02-07
GB1486619A	1977-09-21

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