PROCESS AND APPARATUS TO CONTINUOUSLY FORM A UNIFORM SHEET FOR USE AS A SEMICONDUCTOR POLISHING PAD

Title:

PROCESS AND APPARATUS TO CONTINUOUSLY FORM A UNIFORM SHEET FOR USE AS A SEMICONDUCTOR POLISHING PAD

Document Type and Number:

WIPO Patent Application WO2005055693

Kind Code:

A3

Abstract:

A process and apparatus are disclosed for the continuous manufacture of a polyurethane sheet to be used as polishing pad for chemical-mechanical polishing. The process uses urethane pre-polymers and fillers/additives fed from a tank (10) which is mixed with a curing agent stored in a nitrogen blanked tank (20) inside a dynamic mixer (30). The reacting composition (32) is fed to a feed end of a double steel belt press (40) which is heated and compressed therein. A continuous sheet exits that the belt press (40) and is cut to length by a roller blade cutter (62). Cut sheets (32B) are then stacked (70) and post cured in an oven (80).

Inventors:

SCHNEIDER JOSEPH (US)
HSU OSCAR (US)
WILHEIM VOLKER (US)
WATKA GREG (US)
HACKLER LOTHAR (US)

Application Number:

PCT/US2004/039322

Publication Date:

August 04, 2005

Filing Date:

November 18, 2004

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FREUDENBERG NONWOVENS L P (US)
SCHNEIDER JOSEPH (US)
HSU OSCAR (US)
WILHEIM VOLKER (US)
WATKA GREG (US)
HACKLER LOTHAR (US)

International Classes:

B24D11/00; B29C43/22; B29C47/00; B29C67/24; (IPC1-7): B29C47/00

Foreign References:

US6428586B1	2002-08-06
US4128369A	1978-12-05

Download PDF:

View/Download PDF PDF Help

Previous Patent: SYSTEMS AND METHODS FOR DETERMINING IF OBJECTS ARE IN A QUEUE

Next Patent: PUMP CONTROL SYSTEM AND METHOD