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Patent Searching and Data


Title:
PROCESS FOR FORMATION OF CARBON FILM, AND PROCESS FOR PRODUCTION OF MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2011/111597
Kind Code:
A1
Abstract:
Disclosed is a process for forming a carbon film, which enables the formation of a highly hard and dense carbon film having high wettability to lubricants. Specifically disclosed is a process for forming a carbon film, which comprises: introducing a raw material gas (G) containing carbon and hydrogen into a film formation chamber having a reduced pressure; ionizing the gas (G) by discharging between a filament-like cathode that is heated by power distribution and an anode arranged around the cathode electrode; and accelerating the ionized gas by a bias voltage that is applied to a substrate (D) to irradiate the surface of the substrate (D) with the accelerated gas, thereby forming the carbon film on the surface of the substrate (D). The process is characterized in that a pulse-type negative voltage is employed as the bias voltage to be applied to the surface of the substrate (D).

Inventors:
NAKAJIMA Satoru (5-1 Yawata Kaigan dori, Ichihara-sh, Chiba 67, 〒2900067, JP)
中島 悟 (〒67 千葉県市原市八幡海岸通5番の1 昭和電工エレクトロニクス株式会社内 Chiba, 〒2900067, JP)
Application Number:
JP2011/054889
Publication Date:
September 15, 2011
Filing Date:
March 03, 2011
Export Citation:
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Assignee:
SHOWA DENKO K. K. (13-9, Shibadaimon 1-chome Minato-k, Tokyo 18, 〒1058518, JP)
昭和電工株式会社 (〒18 東京都港区芝大門一丁目13番9号 Tokyo, 〒1058518, JP)
NAKAJIMA Satoru (5-1 Yawata Kaigan dori, Ichihara-sh, Chiba 67, 〒2900067, JP)
International Classes:
G11B5/84
Attorney, Agent or Firm:
SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-ku, Tokyo 20, 〒1006620, JP)
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Claims: