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Title:
PROCESS FOR FORMING ULTRAFINE CRYSTAL LAYER, MACHINE COMPONENT HAVING ULTRAFINE CRYSTAL LAYER FORMED BY THE ULTRAFINE CRYSTAL LAYER FORMING PROCESS, PROCESS FOR PRODUCING THE MACHINE COMPONENT, PROCESS FOR FORMING NANO-CRYSTAL LAYER, MACHINE COMPONENT HAVING NANO-CRYSTAL LAYER FORMED BY NANO-CRYSTAL LAYER FORMING PROCESS, A
Document Type and Number:
WIPO Patent Application WO/2005/070614
Kind Code:
A1
Abstract:
A process for stably forming an ultrafine crystal layer on the surface of a metal product at a low cost. A hole part (1) is bored in a workpiece (W) by means of a drill (D) and a large strain is imparted to the inner circumferential surface of the hole part (1), thus forming an ultrafine crystal layer (C1). The inner circumferential surface of the hole part (1) is subjected to plastic forming with a true strain of at least 1, and the material temperature at the formed surface of the hole part (1) is maintained in a temperature range from the Ac1 transformation point to below the melting point. Alternatively, it is maintained at a temperature not exceeding the Ac1 transformation point. In such a way, an ultrafine crystal layer (C1) can be stably formed on the inner surface of the hole part (1) at a low cost.

Inventors:
Umemoto, Minoru c/o TOYOHASHI UNIVERSITY OF TECHNOLOGY (1-1 Hibarigaoka Tenpaku-cho, Toyohashi-City Aichi 80, 44185, JP)
Todaka, Yoshikazu c/o TOYOHASHI UNIVERSITY OF TECHNOLOGY (1-1 Hibarigaoka Tenpaku-cho, Toyohashi-City Aichi 80, 44185, JP)
Suzuki, Tadashi c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Ota, Toshiichi c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Yamashita, Akihiro (cc/o FUJI UNIVANCE CORPORATION, 2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Tanaka, Shuji c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Application Number:
PCT/JP2004/018650
Publication Date:
August 04, 2005
Filing Date:
December 14, 2004
Export Citation:
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Assignee:
TOYOHASHI UNIVERSITY OF TECHNOLOGY (1-1 Hibarigaoka, Tenpaku-cho Toyohashi-City Aichi, 80, 44185, JP)
FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka, 94, 43104, JP)
Umemoto, Minoru c/o TOYOHASHI UNIVERSITY OF TECHNOLOGY (1-1 Hibarigaoka Tenpaku-cho, Toyohashi-City Aichi 80, 44185, JP)
Todaka, Yoshikazu c/o TOYOHASHI UNIVERSITY OF TECHNOLOGY (1-1 Hibarigaoka Tenpaku-cho, Toyohashi-City Aichi 80, 44185, JP)
Suzuki, Tadashi c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Ota, Toshiichi c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Yamashita, Akihiro (cc/o FUJI UNIVANCE CORPORATION, 2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
Tanaka, Shuji c/o FUJI UNIVANCE CORPORATION (2418 Washizu Kosai-city Shizuoka 94, 43104, JP)
International Classes:
B23B1/00; B23B35/00; B23C3/00; B23P9/00; C21D1/06; C21D7/00; C21D9/00; C21D9/08; (IPC1-7): B23P9/00; B23B35/00; B23C3/00
Foreign References:
JP2002066873A
JP2003522030A
JP2003300354A
JP2004013487A
Other References:
See also references of EP 1707306A1
Attorney, Agent or Firm:
Kaneko, Naohisa (Kaneko International Patent Office, Aioi Insurance Toyohashi Bldg. 7th Floor, 92 Ote-ch, Toyohashi-City Aichi 05, 44008, JP)
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