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Title:
PROCESS FOR FORMING VINYLIDENE FLUORIDE HOMOPOLYMER THIN FILMS
Document Type and Number:
WIPO Patent Application WO/2005/089962
Kind Code:
A1
Abstract:
A process by which thin films made of vinylidene fluoride homopolymers terminated with functional groups for imparting specific functions and having type I crystal structure can be formed on various substrates relatively simply and easily (in terms of application conditions, technique, and so on). Specifically, a process of forming a vinylidene fluoride homopolymer this film by applying a vinylidene fluoride homopolymer which has at one or both ends one or more groups represented by the general formula (1): -(R1)n - Y (wherein R1 is a divalent organic group except vinylidene fluoride monomer unit; n is 0 or 1; and Y is a functional group for imparting specific functions) and which comprises 3 to 100 vinylidene fluoride repeating units to a substrate to form a vinylidene fluoride homopolymer thin film having type I crystal structure as the sole or main structure.

Inventors:
ARAKI TAKAYUKI (JP)
KODANI TETSUHIRO (JP)
Application Number:
PCT/JP2005/004102
Publication Date:
September 29, 2005
Filing Date:
March 09, 2005
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
ARAKI TAKAYUKI (JP)
KODANI TETSUHIRO (JP)
International Classes:
B05D7/24; B32B27/30; C08F8/00; C08F14/22; C08F114/22; (IPC1-7): B05D7/24; B32B27/30; C08F8/00; C08F14/22
Foreign References:
JP2004076108A2004-03-11
JPH07216635A1995-08-15
JPH1186844A1999-03-30
JPH11323052A1999-11-26
JPH11333924A1999-12-07
JP2000070844A2000-03-07
JP2000054000A2000-02-22
JPH03124439A1991-05-28
Attorney, Agent or Firm:
Asahina, Sohta (2-22 Tanimachi 2-chome, Chuo-ku, Osaka-sh, Osaka 12, JP)
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