Title:
PROCESS GAS SUPPLY APPARATUS
Document Type and Number:
WIPO Patent Application WO/1990/012641
Kind Code:
A1
Abstract:
When a process gas prepared by mixing a raw material gas and a diluted gas is supplied to a predetermined process apparatus, the process gas is supplied to the predetermined process apparatus through a connection gas portion which connects at least one raw material gas feed pipe to at least one diluted gas feed pipe in order to eliminate the chance of raw material being exposed to air pollution. Particularly the contact gas portion where the raw material gas and the diluted gas come into contact with each other is made of a material such as a metal or ceramic, any material that might exert adverse influences on the process gas, particularly the emission of organic materials, is eliminated. Furthermore, the degree of dilution of the raw material gas can be changed stepwise by disposing branch pipes and exhaust pipes or changed continuously by the combination with a flow rate regulator.
Inventors:
OHMI TADAHIRO (JP)
SUGIYAMA KAZUHIKO (JP)
NAKAHARA FUMIO (JP)
SUGIYAMA KAZUHIKO (JP)
NAKAHARA FUMIO (JP)
Application Number:
PCT/JP1989/001014
Publication Date:
November 01, 1990
Filing Date:
October 04, 1989
Export Citation:
Assignee:
OHMI TADAHIRO (JP)
International Classes:
B01F23/10; C23C16/44; C23C16/448; C23F4/00; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): B01F15/04
Foreign References:
JPS431065B1 | ||||
JPS4512195B1 | ||||
JPS5850530B2 | 1983-11-11 |
Download PDF:
Previous Patent: EMULGATOR-FREE LIQUID EMULSION AND METHOD AND DEVICE FOR PRODUCING THE EMULSION
Next Patent: DISPERSING AGENT AND CEMENT ADMIXTURE
Next Patent: DISPERSING AGENT AND CEMENT ADMIXTURE