Title:
PROCESS LIQUID COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2019/240397
Kind Code:
A1
Abstract:
The present invention relates to a process liquid composition for reducing microbridge defects of a photoresist pattern comprising polyhydroxystyrene and limited to an extreme ultraviolet exposure source, and a pattern forming method using same. The process liquid composition comprises 0.0001 to 1 wt % of an alkali material, 0.0001 to 1 wt % of a nonionic surfactant having a hydrophilic-lipophilic balance (HLB) value of 9 to 16, and 98 to 99.9998 wt % of water, reduces the number of microbridge defects of a photoresist pattern comprising polyhydroxystyrene and limited to an extreme ultraviolet exposure source, has a low LWR value and thus allows enhanced uniformity of the pattern.
Inventors:
LEE SU JIN (KR)
HAM GYEONG GUK (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
HAM GYEONG GUK (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
Application Number:
PCT/KR2019/006118
Publication Date:
December 19, 2019
Filing Date:
May 22, 2019
Export Citation:
Assignee:
YOUNG CHANG CHEMICAL CO LTD (KR)
International Classes:
G03F7/42; C11D1/72; C11D3/26; C11D11/00; G03F7/20
Domestic Patent References:
| WO2017130825A1 | 2017-08-03 |
Foreign References:
| KR20130123164A | 2013-11-12 | |||
| KR20170003362A | 2017-01-09 | |||
| KR20050082810A | 2005-08-24 | |||
| KR20030043190A | 2003-06-02 | |||
| KR101957875B1 | 2019-03-13 |
Attorney, Agent or Firm:
HAEDAM IP GROUP (KR)
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