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Title:
PROCESS FOR THE PREPARATION OF NITRO COMPOUNDS AND METHOD FOR THE REMOVAL OF NITROGEN DIOXIDE
Document Type and Number:
WIPO Patent Application WO/2000/069803
Kind Code:
A1
Abstract:
A process for the preparation of nitro compounds by reacting an organic substrate with nitrogen dioxide either in the presence of oxygen or under such conditions that the nitrogen dioxide/organic substrate ratio is less than 1 by mole. The reaction may be conducted in the presence of an imide compound such as N-hydroxyphthalimide and the organic substrate includes (a) aliphatic hydrocarbons, (b) alicyclic hydrocarbons, (c) nonaromatic heterocyclic compounds having ring-constituent carbon atoms bonded to hydrogen atoms, (d) compounds bearing aromatic rings and carbon-hydrogen bonds adjacent to the rings, (e) carbonyl compounds bearing carbon-hydrogen bonds adjacent to the carbonyl groups, and so on. This process enables efficient nitration of organic substrates even under relatively mild conditions.

Inventors:
ISHII YASUTAKA (JP)
NAKANO TATSUYA (JP)
Application Number:
PCT/JP2000/003112
Publication Date:
November 23, 2000
Filing Date:
May 16, 2000
Export Citation:
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Assignee:
DAICEL CHEM (JP)
ISHII YASUTAKA (JP)
NAKANO TATSUYA (JP)
International Classes:
B01D53/34; B01D53/56; B01D53/77; C07B43/02; C07C201/06; C07C201/08; C07C201/16; C07C203/08; C07C205/02; C07C205/04; C07C205/05; C07C205/06; C07C205/55; (IPC1-7): C07C201/06; B01D53/34; B01D53/56; B01D53/77; C07B61/00; C07C205/02; C07C205/05; C07C205/06
Domestic Patent References:
WO1998052902A11998-11-26
Foreign References:
EP0850915A11998-07-01
EP0146203A21985-06-26
JPH06134257A1994-05-17
JPS51133182A1976-11-18
Attorney, Agent or Firm:
Goto, Yukihisa (Higashitenma 2-chome Kita-ku Osaka-shi Osaka, Higashitenma 2-chome Kita-ku Osaka-shi Osaka, JP)
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