Title:
PROCESS FOR PRODUCING HEXAFLUOROETHANE AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO2005019141
Kind Code:
A3
Abstract:
A process for producing hexafluoroethane, comprising a step of distilling a crude hexafluoroethane containing chlorine compounds each having two carbon atoms to distill out hexafluoroethane as a top flow from the top of a distillation column and separate a hexafluoroethane mixture containing the chlorine compounds as a bottom flow from the bottom, and a step of contacting the bottom flow with hydrogen fluoride in the gas phase at a temperature of 300 to 500 °C in the presence of a fluorination catalyst to fluorinate the chlorine compounds. This process provides hexafluoroethane which can be used mainly as a cleaning gas in the production process of a semiconductor device.
Inventors:
OHNO HIROMOTO (JP)
ARAI TATSUHARU (JP)
ARAI TATSUHARU (JP)
Application Number:
PCT/JP2004/011709
Publication Date:
May 12, 2005
Filing Date:
August 09, 2004
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
OHNO HIROMOTO (JP)
ARAI TATSUHARU (JP)
OHNO HIROMOTO (JP)
ARAI TATSUHARU (JP)
International Classes:
C07B61/00; C07C17/10; C07C17/20; C11D7/30; C07C17/21; C07C17/354; C07C17/383; C07C17/395; C07C19/08; H01L21/3065; B01J23/26; (IPC1-7): C07C17/383; C07C17/20; C07C17/354; C07C19/08
Domestic Patent References:
| WO2001098240A2 | 2001-12-27 | |||
| WO2003014047A1 | 2003-02-20 | |||
| WO2002018305A2 | 2002-03-07 |
Foreign References:
| US20020183568A1 | 2002-12-05 | |||
| US20030157800A1 | 2003-08-21 |
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