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Patent Searching and Data


Title:
PROCESS FOR PRODUCING HIGH-PURITY (METH)ACRYLIC ACID
Document Type and Number:
WIPO Patent Application WO/2003/059862
Kind Code:
A1
Abstract:
A process for producing high-purity (meth)acrylic acid by distilling crude (meth)acrylic acid containing an aldehyde as an impurity, which comprises reactively treating the crude (meth)acrylic acid beforehand in the presence of an acid catalyst and an aldehyde remover having a content of C12-16 alkyl mercaptans of 98 wt.% or higher and a content of C10 or lower alkyl mercaptans of 5,000 wt.ppm or lower. Thus, high-purity (meth)acrylic acid containing no ingredients emitting an offensive odor can be obtained.

Inventors:
YADA SHUHEI (JP)
TAKASAKI KENJI (JP)
OGAWA YASUSHI (JP)
SUZUKI YOSHIRO (JP)
Application Number:
PCT/JP2003/000105
Publication Date:
July 24, 2003
Filing Date:
January 09, 2003
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP (JP)
YADA SHUHEI (JP)
TAKASAKI KENJI (JP)
OGAWA YASUSHI (JP)
SUZUKI YOSHIRO (JP)
International Classes:
C07C51/44; C07C51/487; (IPC1-7): C07C57/03; C07C51/44; C07C51/487
Foreign References:
EP0169254A11986-01-29
JPH1087551A1998-04-07
JP2001072643A2001-03-21
Attorney, Agent or Firm:
Okada, Kazuhiko (Kudan Kangyo Bldg. 6F, 10-1 Kudan-Kita 1-chom, Chiyoda-ku Tokyo, 102-0073, JP)
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