Title:
PROCESS FOR PRODUCING ITO PARTICLES, ITO POWDER, COATING MATERIAL FOR TRANSPARENT ELECTROCONDUCTIVE MATERIAL, AND TRANSPARENT ELECTROCONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2010/004912
Kind Code:
A1
Abstract:
Disclosed is a process for producing ITO particles that can produce ITO particles without use of a high-boiling solvent as a solvent in the production process by a simple treatment method without through a heating step in an atmosphere which disadvantageously causes sintering among the ITO particles to coarsen the ITO particles. Also disclosed are an ITO powder suitable for a coating material for a transparent electroconductive material and a process for producing the ITO powder. The process for producing the ITO powder comprises a first step of dissolving an indium-containing salt and a tin-containing salt in an organic solvent and adding an organic solvent containing a basic precipitant to the organic solvent to prepare a mixture of a precursor containing indium and tin with the organic solvent, and a second step of heating the mixture of the precursor containing indium and tin with the organic solvent at a temperature of 200 to 300°C within a pressurized vessel to produce ITO particles.
Inventors:
MURAMATSU Atsushi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
村松 淳司 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
KANIE Kiyoshi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
蟹江 澄志 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
SAITO Kazuhisa (C/O DOWA ELECTRONICS MATERIALS CO, LTD. 14-1 Sotokanda 4-chome, Chiyoda-k, Tokyo 21, 〒1010021, JP)
村松 淳司 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
KANIE Kiyoshi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
蟹江 澄志 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
SAITO Kazuhisa (C/O DOWA ELECTRONICS MATERIALS CO, LTD. 14-1 Sotokanda 4-chome, Chiyoda-k, Tokyo 21, 〒1010021, JP)
Application Number:
JP2009/061946
Publication Date:
January 14, 2010
Filing Date:
June 30, 2009
Export Citation:
Assignee:
TOHOKU UNIVERSITY (1-1 Katahira 2-chome, Aoba-ku Sendai-shi Miyagi, 77, 〒9808577, JP)
国立大学法人 東北大学 (〒77 宮城県仙台市青葉区片平二丁目１番１号 Miyagi, 〒9808577, JP)
DOWA ELECTRONICS MATERIALS CO., LTD. (14-1, Sotokanda 4-chome Chiyoda-k, Tokyo 21, 〒1010021, JP)
ＤＯＷＡエレクトロニクス株式会社 (〒21 東京都千代田区外神田四丁目１４番１号 Tokyo, 〒1010021, JP)
MURAMATSU Atsushi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
村松 淳司 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
KANIE Kiyoshi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
国立大学法人 東北大学 (〒77 宮城県仙台市青葉区片平二丁目１番１号 Miyagi, 〒9808577, JP)
DOWA ELECTRONICS MATERIALS CO., LTD. (14-1, Sotokanda 4-chome Chiyoda-k, Tokyo 21, 〒1010021, JP)
ＤＯＷＡエレクトロニクス株式会社 (〒21 東京都千代田区外神田四丁目１４番１号 Tokyo, 〒1010021, JP)
MURAMATSU Atsushi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
村松 淳司 (〒77 宮城県仙台市青葉区片平二丁目１番１号 国立大学法人東北大学内 Miyagi, 〒9808577, JP)
KANIE Kiyoshi (C/O TOHOKU University 1-1, Katahira 2-chome Aoba-k, Sendai-shi Miyagi 77, 〒9808577, JP)
International Classes:
C01G19/00; C09D5/24; C09D7/12; C09D201/00; H01B5/00; H01B5/14; H01B13/00
Attorney, Agent or Firm:
ANIYA Setuo et al. (21 TOWA BLDG. 3F, 4-6-1 Iidabashi, Chiyoda-k, Tokyo 72, 〒1020072, JP)