PROCESS FOR PRODUCING LUMINANT EXCITABLE WITH VACUUM ULTRAVIOLET RADIATION, LUMINANT EXCITABLE WITH VACUUM ULTRAVIOLET RADIATION AND LUMINOUS ELEMENT INCLUDING THE SAME

WIPO Patent Application WO/2004/061049

A1

A plasma display panel having its thermal degradation and VUV deterioration reduced through enhancement of the crystallinity of luminant excitable with vacuum ultraviolet radiation to thereby attain an enhancement of luminous efficiency; and a process for producing the same. The plasma display panel comprises a pair of opposite arranged substrates and, interposed therebetween, a phosphor layer that is excited with vacuum ultraviolet radiation to thereby emit light, the phosphor layer containing spherical fine particles of a luminant excitable with vacuum ultraviolet radiation. The luminant is composed only of a matrix substance and an activator and is highly pure without having any impurity phase. Accordingly, the phosphor layer can be formed while maintaining the luminance of luminant excitable with vacuum ultraviolet radiation, so that the luminescence intensity of phosphor layer can be enhanced. Thus, there can be provided a plasma display of high luminance.

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Chao-nan XU. c/o NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY Kyushu-center (807-1 Aza-Nonoshita, Shuku-mach, Tosu-shi Saga, 841-0052, JP)
Shi, Wensheng c/o Technical, Institute Of Physics And Chemistry Chinese Academy Of Science (Jia No. 3 Datunl, Chaoyangqu Beijing 1, 10010, JP)
Nishikubo, Keiko c/o NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY Kyushu-center (807-1 Aza-Nonoshita, Shuku-mach, Tosu-shi Saga, 841-0052, JP)
Zhang, Shuxiu c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)
Obata, Michio c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)
Tanno, Hiroaki c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)

PCT/JP2003/017077

July 22, 2004

December 26, 2003

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DAIDEN CO., LTD. (15-1, Minami2-chome Kurume-shi, Fukuoka, 830-8511, JP)
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (1-3-1, Kasumigaseki Chiyoda-ku, Tokyo, 100-8921, JP)
Chao-nan XU. c/o NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY Kyushu-center (807-1 Aza-Nonoshita, Shuku-mach, Tosu-shi Saga, 841-0052, JP)
Shi, Wensheng c/o Technical, Institute Of Physics And Chemistry Chinese Academy Of Science (Jia No. 3 Datunl, Chaoyangqu Beijing 1, 10010, JP)
Nishikubo, Keiko c/o NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY Kyushu-center (807-1 Aza-Nonoshita, Shuku-mach, Tosu-shi Saga, 841-0052, JP)
Zhang, Shuxiu c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)
Obata, Michio c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)
Tanno, Hiroaki c/o DAIDEN CO. LTD. (2100-19, Tsutsumi, Kamimine-mach, Miyaki-gun Saga, 849-0124, JP)

C09K11/64; C09K11/08; C09K11/77; H01J1/63; H01J11/02; (IPC1-7): C09K11/08; C09K11/64; H01J11/02; H01J9/227

Kajihara, Katsuhiko (Kajihara Patent Attorny, 18-55 Hiyoshi-mach, Kurume-shi Fukuoka, 830-0017, JP)

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