Title:
PROCESS FOR PRODUCING REFLECTIVE LAYER, AND REFLECTIVE LAYER
Document Type and Number:
WIPO Patent Application WO/2017/169696
Kind Code:
A1
Abstract:
The present invention provides: a process for producing a reflective layer that has excellent diffuse reflection properties; and a reflective layer. The process for producing a reflective layer of the present invention comprises: a step 1 in which a composition comprising a liquid-crystal compound and a chiral agent is applied to a substrate and the composition is heated to align the liquid-crystal compound, thereby forming a cholesteric liquid-crystal phase; and a step 2 in which the composition is cooled or heated so that the helical twisting power of the chiral agent contained in the composition in the state of the cholesteric liquid-crystal phase increases by at least 5%, thereby forming a reflective layer.
Inventors:
KATOH SHUNYA (JP)
TAKASAGO RIE (JP)
TAKASAGO RIE (JP)
Application Number:
PCT/JP2017/010004
Publication Date:
October 05, 2017
Filing Date:
March 13, 2017
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30; G02B5/08; G02F1/1335; G02F1/1337
Foreign References:
| JP2007206112A | 2007-08-16 | |||
| JP2008197223A | 2008-08-28 | |||
| JP2016012047A | 2016-01-21 | |||
| JP2006323312A | 2006-11-30 | |||
| JP2005049866A | 2005-02-24 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
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