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Patent Searching and Data


Title:
PROCESS FOR PRODUCING REGENERATED TARGET
Document Type and Number:
WIPO Patent Application WO/2010/073964
Kind Code:
A1
Abstract:
A regenerated target reduced in void content is produced by sintering with uniaxial pressing. A process comprises: a powder filling step in which a spent target (1) is placed in the inner space (12A) of a frame jig (12) having an inner space (12A) piercing in a uniaxial direction, and a raw-material powder for targets (2) is filled into the inner space (12A) to cover the erosion part (1A) side of the spent target (1) with the raw-material powder for targets (2); a cushioning-material disposition step in which a deformable cushioning material (3) is disposed so that the raw-material powder for targets (2) which has been filled into the inner space (12A) in the powder filling step is sandwiched between the spent target (1) and the cushioning material (3); and a sintering step in which the raw-material powder for targets (2) which has been filled into the inner space (12A) and the spent target (1) are pressed in the uniaxial direction through the cushioning material (3) disposed in the cushioning-material disposition step and are sintered.

Inventors:
YAMAMOTO TOSHIYA (JP)
MIYASHITA TAKANOBU (JP)
ITOH OSAMU (JP)
Application Number:
PCT/JP2009/071055
Publication Date:
July 01, 2010
Filing Date:
December 17, 2009
Export Citation:
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Assignee:
TANAKA HOLDINGS CO LTD (JP)
YAMAMOTO TOSHIYA (JP)
MIYASHITA TAKANOBU (JP)
ITOH OSAMU (JP)
International Classes:
C23C14/34; C04B35/645
Foreign References:
JPS6393859A1988-04-25
JP2005112658A2005-04-28
JP2006272420A2006-10-12
JP2004035919A2004-02-05
Attorney, Agent or Firm:
MATSUYAMA, Keisuke et al. (JP)
Keisuke Matsuyama (JP)
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