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Title:
PROCESS FOR PRODUCING TETRAALKYLAMMONIUM SALT, AND PROCESS FOR PRODUCING TETRAALKYLAMMONIUM HYDROXIDE USING SAME AS RAW MATERIAL
Document Type and Number:
WIPO Patent Application WO/2012/090699
Kind Code:
A1
Abstract:
[Problem] In a case where tetraalkylammonium (TAA) ions are recovered from waste liquor from development or the like using a cation-exchange resin in a conventional manner, the obtained TAA salt is contaminated with metal ions. Therefore, attempts to produce TAA hydroxide using the TAA salt as raw material result in products which are significantly contaminated with metal impurities. [Solution] A TAA salt solution with a low metal ion concentration can be obtained by a process which comprises bringing a solution that contains both metal ions and TAA ions, such as a waste liquor from the development of a photoresist, into contact with a cation-exchange resin to make the TAA ions adsorbed on the cation-exchange resin, and then passing an acid through the resulting cation-exchange resin to recover a TAA salt, and in which the recover is stopped before the pH of the obtained TAA salt solution lowers to a prescribed level or lower and/or before the change in the electric conductivity thereof reaches a prescribed margin or more. Further, a high-purity TAAH solution can be obtained either by bringing the TAA salt thus obtained into contact with an anion-exchange resin which has previously been converted to the OH form or by subjecting the TAA salt thus obtained to electrolysis.

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Inventors:
MURATA AKIKO (JP)
UMEZU NAOYUKI (JP)
TONO SEIJI (JP)
TAIRA HIROAKI (JP)
Application Number:
PCT/JP2011/078801
Publication Date:
July 05, 2012
Filing Date:
December 13, 2011
Export Citation:
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Assignee:
TOKUYAMA CORP (JP)
MURATA AKIKO (JP)
UMEZU NAOYUKI (JP)
TONO SEIJI (JP)
TAIRA HIROAKI (JP)
International Classes:
C07C209/84; B01J49/00; C02F1/42; C07C211/63
Domestic Patent References:
WO2011036942A12011-03-31
Foreign References:
JP2004066102A2004-03-04
JP2003340449A2003-12-02
Attorney, Agent or Firm:
MAEDA, Hitoshi et al. (JP)
Hitoshi Maeda (JP)
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Claims: