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Patent Searching and Data


Title:
PROCESS FOR PRODUCTION OF CARBONYL FLUORIDE
Document Type and Number:
WIPO Patent Application WO/2007/037468
Kind Code:
A1
Abstract:
A process for producing COF2 safely and continuously without using a toxic raw material such as phosgene or a difficultly available raw material at a lower cost with high efficiency without a danger of explosion or the like. According to the invention, carbonyl fluoride is produced by introducing tetrafluoroethylene gas and oxygen gas into a reactor and reacting both with each other in a gas phase under heating in the absence of nitrogen gas. The reactor is preferably a tubular one. The tetrafluoroethylene gas may be unpurified or purified one obtained by pyrolysis of HCFC-22 gas under heating. Thus, COF2 gas useful as cleaning gas for CVD (chemical vapor deposition) system can be efficiently and safely produced at a lower cost.

Inventors:
QUAN HENG-DAO (JP)
TAMURA MASANORI (JP)
SEKIYA AKIRA (JP)
Application Number:
PCT/JP2006/319652
Publication Date:
April 05, 2007
Filing Date:
September 26, 2006
Export Citation:
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Assignee:
NAT INST OF ADVANCED IND SCIEN (JP)
QUAN HENG-DAO (JP)
TAMURA MASANORI (JP)
SEKIYA AKIRA (JP)
International Classes:
C01B31/00
Foreign References:
US3404180A1968-10-01
JP2003267712A2003-09-25
JP2004277215A2004-10-07
Other References:
ORLOFF D. ET AL.: "An experimental study of the afterburning region of lean tetrafluoroethylene-oxygen flames", COMBUSTION AND FLAME, vol. 26, 1976, pages 141 - 150, XP003011079
GOZZO F. ET AL.: "The thermal decomposition of chlorodifluoromethane", TETRAHEDRON, vol. 22, no. 10, 1966, pages 3329 - 3336, XP003011080
Attorney, Agent or Firm:
DAITO, Teruo (Kyowa Kogyo Bldg. 21-40, Takanawa 2-chom, Minato-ku Tokyo 74, JP)
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